发明名称 Semiconductor device and manufacturing method of the same
摘要 A semiconductor device includes a first device region including a plurality of source regions and a plurality of drain regions of first conductivity type transistors, a plurality of loop-shaped gate electrode regions of the first conductivity type transistors, a second device region including a plurality of source regions and a plurality of drain regions of a second conductivity type transistors, a plurality of loop-shaped gate electrode regions of the second conductivity type transistors, a first wiring configured to supply a first voltage to at least one of the source regions of the first device region, a second wiring configured to supply a second voltage to at least one of the source regions of the second device region, and a third wiring electrically coupled to the drain regions of the first and second device regions and to the gate electrode regions of the first and the second conductivity type transistors.
申请公布号 US7456481(B2) 申请公布日期 2008.11.25
申请号 US20060496452 申请日期 2006.08.01
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 INABA SATOSHI;FUJIWARA MAKOTO
分类号 H01L29/423;H01L29/76;H01L21/28;H01L21/8238;H01L27/02;H01L27/07;H01L27/08;H01L27/092;H01L27/11;H01L27/12;H01L27/148;H01L29/41;H01L29/49;H01L29/786 主分类号 H01L29/423
代理机构 代理人
主权项
地址