A METHOD OF MANUFACTURING FOR METAL LINE PATTERN

摘要

The uniformity of the metal line pattern is improved by reducing the density difference of the metal line pattern and by preventing dishing by the chemical mechanical polishing process. The first metal line pattern(10) supplies the different power source to the block consisting of a plurality of cells. The second metal line pattern(20) is formed between the first metal line pattern and delivers signals between cells. The dummy metal line pattern is formed between the second metal line patterns and is divided into at least two in the longitudinal direction of the second metal line pattern.