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发明名称
SURFACE TREATMENT FOR MULTI-LAYER WAFERS FORMED FROM LAYERS OF MATERIALS CHOSEN FROM AMONG SEMICONDUCTING MATERIALS
摘要
申请公布号
KR100869399(B1)
申请公布日期
2008.11.21
申请号
KR20067011259
申请日期
2006.06.08
申请人
发明人
分类号
H01L21/20;H01L21/324;H01L21/762
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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