DRY CLEANING METHOD OF SEMICONDUCTOR PRODUCTION DEVICE HAVING MUTI-LIFTER

摘要

The life of the lift cylinder and the production cost can be reduced can be extended by performing the dry clean process that the lift pin is not moved and a electrostatic chuck cathode part is moved up. The dry cleaning method of the semiconductor manufacturing facilities having the multiple lifter is provided. A step(102) is for detecting whether the wafer is transferred to outside from the electrostatic chuck when the dry clean cycle comes. A step(104) is for elevating the electrostatic chuck cathode part when the wafer was transferred from the electrostatic chuck. A step(105) is for progressing the dry clean process using the plasma by the electrostatic chuck cathode part. A step(107) is for dropping the electrostatic chuck cathode part when the dry clean process is completed.