PLASMA PROCESSING APPARATUS

摘要

The plasma processing apparatus is provided to improve the lifetime of equipment and reduce the maintenance cost by not directly exposing the lower-part of the insulation part to the plasma or the process gas. The plasma processing apparatus includes the bottom electrode part(10) which is equipped on the lower part of the chamber and on which the substrate(S) is settled; the insulation part(30) circling around the edge of both sides or the upper side of the bottom electrode part; the ceramic plate(20) circling around the insulation part; the cover member(40) protecting the lower part of the insulation part from the plasma and process gas.