| 摘要 |
<p>An exposure apparatus is provided to minimize the maintenance frequency of the optical element by suppressing the attachment of gas particle on the optical element. An exposure apparatus comprises the optical element in which EUV is incident; the telescopic supporting the optical element; the chamber where the telescopic is accepted; the partition installed inside the telescopic in order to surround the optical path of EUV. The exposure apparatus(10) exposes the pattern of the disk(11) on the top of the substrate using EUV.</p> |
