发明名称 AG ALLOY TARGET, AG ALLOY SPUTTERING TARGET AND AG ALLOY THIN FILM FOR THE ELECTROMAGNETIC INTERFERENCE SHIELDING
摘要 An Ag alloy thin film with superior heat resistance, corrosion resistance and cohesive power for the electromagnetic interference shielding is required as the material for the electromagnetic interference shielding, and the corrosion resistance and cohesive power are provided. Ag alloy target for the electromagnetic interference shielding comprise at least one element selected in the lanthanide consisting of the pr, nd, eu, dy and Er and Cu and Ag. The sum total selected in the crowd of the lanthanide consisting of the pr, nd, eu, dy and Er of element more than the first class added amount of the metal element is 0.05~3.5wt%, Cu 0.05~3.5wt%, remnant is Ag.
申请公布号 KR20080101071(A) 申请公布日期 2008.11.21
申请号 KR20070047294 申请日期 2007.05.15
申请人 HEE SUNG METAL LTD. 发明人 YANG, SEUNG HO;HONG, GIL SU
分类号 C23C14/34 主分类号 C23C14/34
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