| 摘要 |
<p>The conditioning system and a lithography apparatus are provided to control the purity and the temperature of the provided gas. The conditioning system(10, 110) comprises the first fluid distribution chamber and the second fluid distribution chamber. The second fluid distribution chamber includes the plurality of fluid outflow paths which has the number of Reynolds of fluid smaller than 150. The average pressure at the upper stream inlet port within the second chamber is higher than the pressure at the downstream outlet port side of the fluid outflow path with the maximum 50 Pa. The fluid flux regulator distributes the fluid to the second chamber from the first chamber.</p> |
