发明名称 Supraleitfähigkeit in mit Bor dotierter Diamant-Dünnschicht
摘要 A heavily boron-doped diamond thin film having superconductivity is deposited by chemical vapor deposition using gas mixture of at least carbon compound and boron compound, including hydrogen. An advantage of the diamond thin film deposited by the chemical vapor deposition is that it can contain boron at high concentration, especially in (111) oriented films. The boron-doped diamond thin film deposited by the chemical vapor deposition shows the characteristics of typical type II superconductor.
申请公布号 DE602005010144(D1) 申请公布日期 2008.11.20
申请号 DE20056010144T 申请日期 2005.05.23
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE, TSUKUBA 发明人 TAKANO, Y.;NAGAO, M.;TACHIKI, M.;KAWARADA, H.;UMEZAWA, HITOSHI;KOBAYASHI, KENSAKU
分类号 C23C16/27;H01L39/12;H01L39/24 主分类号 C23C16/27
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