发明名称 DATA REWRITING METHOD FOR NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide the data rewriting method of a non-volatile semiconductor memory device for improving deletion time by a hot carrier, and for suppressing the increase of manufacturing costs. <P>SOLUTION: In the non-volatile semiconductor memory device in which a rewritable non-volatile memory transistor having a control gate electrode and a floating gate electrode as a gate electrode is formed on a semiconductor substrate, the data rewriting method of the non-volatile semiconductor memory includes: injecting electrons put in a high energy state into the floating gate electrode to set a data writing state upon writing; and injecting a hot hole due to avalanche breakdown into a floating gate electrode to delete data upon deletion. After writing, at least deletion is partially performed in such a state that the temperature of a non-volatile memory transistor formation region in the semiconductor substrate is raised by heating more than that in the state prior to heating. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008283082(A) 申请公布日期 2008.11.20
申请号 JP20070127333 申请日期 2007.05.11
申请人 DENSO CORP 发明人 TAI AKIRA
分类号 H01L21/8247;G11C16/02;H01L27/10;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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