发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To exactly detect the presence or the absence of foreign matter even on a substrate having an undulating surface by creating a threshold value information used for determining the presence or not of the foreign matter based on a change in quantity of light received by an optical sensor for the whole surface of the upper surface of the substrate with no foreign matter stuck thereto. SOLUTION: The substrate processing apparatus is provided with a surface plate 1, an application head 3, sensors 4, 5 and a control part 8. The control part 8 stores in time series the detected signal of the sensors 4, 5 detected during the period of time that the application head 3 discharging no processing liquid moves along the moving direction Y1 and the control part 8 forms the threshold value data of the data detected continuously along the moving direction Y1 based on the stored content. While the application head 3 discharging processing liquid moves on the whole upper surface of the substrate 100, the control part 8 determines the presence or not of the foreign matter on the upper surface of the substrate 100 based on the result obtained by comparing between the detected data and the threshold data and controls the movement of the application head 3 based on the determination result. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008279388(A) 申请公布日期 2008.11.20
申请号 JP20070126778 申请日期 2007.05.11
申请人 TATSUMO KK 发明人 ODA MITSUNORI;KADOTA SHINJI
分类号 B05C11/00;B05C5/02;G02F1/13 主分类号 B05C11/00
代理机构 代理人
主权项
地址