发明名称 |
POLISHING PAD, USE THEREOF AND METHOD FOR MAKING THE SAME |
摘要 |
The present invention mainly relates to a polishing pad that comprises a buffer sheet, a polishing sheet and adhesive for adhering the buffer sheet to the polishing sheet. The buffer sheet comprises fibers. The polishing sheet comprises a first elastomer. The adhesive comprises a second elastomer. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad described above are also provided.
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申请公布号 |
US2008287047(A1) |
申请公布日期 |
2008.11.20 |
申请号 |
US20070750352 |
申请日期 |
2007.05.18 |
申请人 |
SANG FANG CHEMICAL INDUSTRY CO., LTD. |
发明人 |
FENG CHUNG-CHIH;YAO I-PENG;CHAO CHEN-HSIANG;HUNG YUNG-CHANG |
分类号 |
B24D11/00;B24D18/00 |
主分类号 |
B24D11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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