| 摘要 |
A coating material for a photoresist pattern includes a water-soluble polymer and an additive mixed with the water-soluble polymer. The additive may be at least one selected from the group represented by Formulas 1 and 2: wherein X and Y respectively represent one selected from a heteroatom group consisting of N, O and S, and R<SUB>1 </SUB>to R<SUB>8 </SUB>respectively represent one selected from an electron donating group consisting of an alkyl group and -H, and wherein X and Y respectively represent one selected from a heteroatom group consisting of N, O and S, and R<SUB>1 </SUB>to R<SUB>7 </SUB>respectively represent one selected from an electron donating group consisting of an alkyl group and -H.
|
