发明名称 PHOTOSENSITIVE COMPOSITION, CURED FILM USING THE SAME AND DISPLAY ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition having high sensitivity, good developability and good storage stability and capable of forming a cured film having high heat resistance, and a display element including the cured film. <P>SOLUTION: The photosensitive composition comprises: a copolymer (A) obtained by polymerizing a monomer mixture including an N-substituted maleimide and a carboxy-containing radical polymerizable monomer; a copolymer (B) obtained by polymerizing a monomer mixture including an N-substituted maleimide and a radical polymerizable monomer containing a heat crosslinkable functional group; a photopolymerization initiator (C); and a radical polymerizable compound (D) having two or more radical polymerizable double bonds. A cured film or a protective film for a color filter produced using the composition and the display element are also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008281621(A) 申请公布日期 2008.11.20
申请号 JP20070123444 申请日期 2007.05.08
申请人 CHISSO CORP 发明人 ITAMI SETSUO;OOIZUMI FUMITAKA;SATO HIROYUKI
分类号 G03F7/033;G02B5/20;G03F7/027;G03F7/031;G03F7/038 主分类号 G03F7/033
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