发明名称 DEFECT CLASSIFICATION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a defect classification system capable of performing classification similar to human judgement on defects such as resist coating irregularities, exposure failures, flaws, the adhesion of dust without having to register defect data in micro-inspections principally on semiconductor wafers and liquid crystal panels. SOLUTION: The defect classification system for determining the types of defects detected on the basis of images of bodies to be inspected includes a characteristics extraction means 102 including a means for extracting characteristic amounts from images of detected defect regions and extracting characteristic amounts from the shape of arrangement of at least two detection regions; an inference determination means 106 for determining the type of defects on the basis of the characteristic amounts extracted by the characteristics extraction means 102; and a definite region removal means 107 for removing, from the images of the defect regions, regions of which the type of defects has been defined determined by the inference determination means 106. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008281580(A) 申请公布日期 2008.11.20
申请号 JP20080167743 申请日期 2008.06.26
申请人 OLYMPUS CORP 发明人 KANDA YAMATO
分类号 G01N21/956;G06T1/00;G06T7/00 主分类号 G01N21/956
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