发明名称 Mask and Manufacturing Method Thereof
摘要 A blank mask is provided. The blank mask includes a mask layer disposed on a transparent quartz substrate, and a nano inorganic material-polymer complex layer. The nano inorganic material-polymer complex layer has nano-scale components and is formed on a surface of the mask layer to adsorb a residual contamination source remaining on the surface of the mask layer and to protect the surface of the mask layer from external contamination sources. The nano inorganic material-polymer complex layer can include a nano clay-polymer composite where PVDF is interposed between the nano clay plate-shaped layers. The contamination sources can be removed from the mask layer surface by removing the composite layer.
申请公布号 US2008286663(A1) 申请公布日期 2008.11.20
申请号 US20070958523 申请日期 2007.12.18
申请人 HYNIX SEMICONDUCTOR INC. 发明人 JEONG SOO KYEONG
分类号 G03F1/00 主分类号 G03F1/00
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