发明名称 |
METHOD FOR MANUFACTURING DIELECTRIC MULTILAYER FILM FILTER AND MANUFACTURING DEVICE FOR DIELECTRIC MULTILAYER FILM FILTER |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a dielectric multilayer film filter with improved wavelength selectivity and to provide a manufacturing device for a dielectric multilayer film filter. SOLUTION: A first chamber FL and a second chamber FH mount targets 18 made of dielectric materials having the respective refractive indices or essentially comprising conductive elements included in the dielectric materials, and low refractive index layers and high refractive index layers are formed by sputtering the targets 18. Upon sputtering the respective targets 18 in the first chamber FL and in the second chamber FH, the corresponding bias power supply G1 is driven to apply a negative bias potential to a substrate 2 while the corresponding heat exchanger HX is driven to control the temperature of the substrate 2 to room temperature. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2008281958(A) |
申请公布日期 |
2008.11.20 |
申请号 |
JP20070128516 |
申请日期 |
2007.05.14 |
申请人 |
ULVAC JAPAN LTD |
发明人 |
KIMURA ISAO;JINBO TAKETO;KIKUCHI MAKOTO;NISHIOKA HIROSHI;SUU KOUKO |
分类号 |
G02B5/28;C23C14/08;C23C14/34 |
主分类号 |
G02B5/28 |
代理机构 |
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