AN APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUBSTRATE IN A PROCESSING CHAMBER
摘要
<p>An apparatus and method for supporting, positioning and rotating a substrate are provided. In one embodiment, a support assembly for supporting a substrate includes an upper base plate and a lower base plate. The substrate is floated on a thin layer of air over the upper base plate. A positioning assembly includes a plurality of air bearing edge rollers or air flow pockets used to position the substrate in a desired orientation inside above the upper base plate. A plurality of slanted apertures or air flow pockets are configured in the upper base plate for flowing gas therethrough to rotate the substrate to ensure uniform heating during processing.</p>
申请公布号
WO2008141105(A1)
申请公布日期
2008.11.20
申请号
WO2008US63105
申请日期
2008.05.08
申请人
APPLIED MATERIALS, INC.;KOELMEL, BLAKE;LERNER, ALEXANDER N.;RANISH, JOSEPH M.;SANGAM, KEDARNATH;SORABJI, KHURSHED
发明人
KOELMEL, BLAKE;LERNER, ALEXANDER N.;RANISH, JOSEPH M.;SANGAM, KEDARNATH;SORABJI, KHURSHED