Temperature-dependent single-waved imaging defect correcting method for use during manufacturing of e.g. micro-structured element, involves shifting correction element perpendicular to local optical axis of correction element

摘要

The method involves arranging a sample (16) in an object level (14) of a projection lens (12) on a substrate (20) arranged in an image plane (18) of the lens. An image center of an image field produced on the substrate does not lie on a local optical axis (40a) of the lens in an image field-close area. A correction element among optical elements (32-38) is tilted, and is shifted perpendicular to the local optical axis of the correction element to correct single-waved imaging defects caused due to asymmetrical lens heating. Independent claims are also included for the following: (1) a method for microlithographic manufacture of micro-structured elements (2) a micro-structured element comprising a substrate (3) a projection lens comprising optical elements.