发明名称 MIRROR MAGNETRON PLASMA SOURCE
摘要 A new and useful plasma source (100) is provided, comprising at least one electrode (29) connected to an alternating current power supply and disposed adjacent to a portion of a grounded substrate (2). The electrode has a center magnet (3) that produces a magnetron plasma (16) at the electrode (29) when the electrode is biased negative by the alternating power supply, and a mirror plasma (15) on the substrate (2) when the electrode (29) is biased positive by the alternating power supply.
申请公布号 WO2007109198(A3) 申请公布日期 2008.11.20
申请号 WO2007US06743 申请日期 2007.03.16
申请人 APPLIED PROCESS TECHNOLOGIES, INC.;MADOCKS, JOHN 发明人 MADOCKS, JOHN
分类号 C23C14/35;C23C16/00;H01L21/00 主分类号 C23C14/35
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