发明名称 |
MIRROR MAGNETRON PLASMA SOURCE |
摘要 |
A new and useful plasma source (100) is provided, comprising at least one electrode (29) connected to an alternating current power supply and disposed adjacent to a portion of a grounded substrate (2). The electrode has a center magnet (3) that produces a magnetron plasma (16) at the electrode (29) when the electrode is biased negative by the alternating power supply, and a mirror plasma (15) on the substrate (2) when the electrode (29) is biased positive by the alternating power supply.
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申请公布号 |
WO2007109198(A3) |
申请公布日期 |
2008.11.20 |
申请号 |
WO2007US06743 |
申请日期 |
2007.03.16 |
申请人 |
APPLIED PROCESS TECHNOLOGIES, INC.;MADOCKS, JOHN |
发明人 |
MADOCKS, JOHN |
分类号 |
C23C14/35;C23C16/00;H01L21/00 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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