发明名称 DEVICE FOR TRANSFERRING STRUCTURE PROVIDED IN MASK ONTO SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a device 1 for transferring a structure provided in a mask 2 onto a substrate 3. <P>SOLUTION: A device is provided which is provided with: at least one illumination device 9 for uniformly irradiating a part of the mask 2; a mask holding device 7 for holding the mask 2 in a mask plane 8 defined by an X axis and a Y axis perpendicular to the X axis; at least one lens arrangement 6 arranged above the mask plane 8 on the side opposite to the illumination device 9 to map the structure onto the substrate 3; a substrate holding device 4 arranged a distance spaced apart from the lens arrangement 6 so that the substrate 3 may be held in a substrate plane 5 parallel to the mask plane 8; and a means for synchronously moving the illumination device 9 and the lens arrangement 6 in parallel, relatively to the mask plane 8 and the substrate plane 5 along the X axis and/or the Y axis. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008283196(A) 申请公布日期 2008.11.20
申请号 JP20080126363 申请日期 2008.05.13
申请人 THALLNER ERICH 发明人 THALLNER ERICH
分类号 H01L21/027 主分类号 H01L21/027
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