| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress a variation of the polishing amount of an element by suppressing a variation of pressing force of the polishing target element. <P>SOLUTION: This polishing device for a slider is provided with: a rotatable polishing surface plate to grind the element to be used as the slider; a pressing force adjusting member 31 having an internal space 32 and extended along a polishing surface plate orthogonal axis C orthogonal to the polishing surface plate; a pusher 6 connected to the pressing force adjusting member 31 and used to push the element; and a gas supply means 51 connected to the pressing force adjusting member 31 and supplying gas to the internal space 32. The pressing force adjusting member 31 has: a first portion 34 including a connecting part with the pusher 6; a second portion 36 including a communication part with the internal space 32 and the gas supply means 51; and an axial direction deformation part 37 which is provided between the first and second portions 34, 36, the length of which in the direction of the polishing surface plate orthogonal axis C is changed in accordance with the pressure of the internal space 32. Due to the deformation of the axial direction deformation part 37, the pressing force of the pressing force adjusting member 31 with respect to the pusher 6 is changed. <P>COPYRIGHT: (C)2009,JPO&INPIT |
