发明名称 |
Image Sensor and Method for Manufacturing the Same |
摘要 |
An image sensor according to one embodiment of the present invention includes a semiconductor substrate having a CMOS circuit formed therein; an interlayer dielectric layer formed on the semiconductor substrate and including a trench formed therein; a metal wiring and a first conductive layer formed within the trench of the interlayer dielectric layer; an intrinsic layer formed on the semiconductor substrate including the first conductive layer and the interlayer dielectric layer; and a second conductive layer formed on the intrinsic layer.
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申请公布号 |
US2008283881(A1) |
申请公布日期 |
2008.11.20 |
申请号 |
US20070842787 |
申请日期 |
2007.08.21 |
申请人 |
LEE MIN HYUNG |
发明人 |
LEE MIN HYUNG |
分类号 |
H01L31/062;H01L21/00;H01L27/146;H04N5/335;H04N5/369;H04N5/374 |
主分类号 |
H01L31/062 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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