摘要 |
<p>In a method for fabricating a mold (228, 230) for generating nanostructures a sequence (200) of layers comprising a first layer (202) and a second layer (204) is provided, a third layer (208) is provided on a first surface (206) formed by the first layer (202) and the second layer (204), wherein the material of the first layer (202) and the material of the second and third layers (204, 206) are selectively processable with respect to each other; and a second surface (210) formed by the first layer, the second layer (204) and the third layer (208) is processed to remove a portion of the material of the first layer (202) or a portion of the material of the second and third layers (204, 208), or to add material to the first layer (202) or to the second and third layers (204, 208) to generate a 3-D surface profile.</p> |
申请人 |
TECHNISCHE UNIVERSITAET MUENCHEN;HARRER, STEFAN;STROBEL, SEBASTIAN;LUBER, SEBASTIAN;SCARPA, GIUSEPPE;BRUNETTI, FRANCESCA;LUGLI, PAOLO;TORNOW, MARC;ABSTREITER, GERHARD |
发明人 |
HARRER, STEFAN;STROBEL, SEBASTIAN;LUBER, SEBASTIAN;SCARPA, GIUSEPPE;BRUNETTI, FRANCESCA;LUGLI, PAOLO;TORNOW, MARC;ABSTREITER, GERHARD |