| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus for improving productivity. <P>SOLUTION: The exposure apparatus includes a chuck for holding substrates and exposes the substrates held by the chuck in accordance with parameters preset for each job for exposing the substrates. The exposure apparatus is also provided with a setting means for setting allowable values in regard to sizes of foreign matters adhered to the chuck as parameters and a testing means for testing foreign matters adhered to the chuck on the basis of the allowable values preset by the setting means in order to execute processes regarding maintenance of the chuck based on the result of test by the testing means. <P>COPYRIGHT: (C)2009,JPO&INPIT |
