发明名称 MANUFACTURING METHOD FOR NOZZLE SUBSTRATE, LIQUID DROPLET EJECTION HEAD AND LIQUID DROPLET EJECTOR
摘要 PROBLEM TO BE SOLVED: To obtain a manufacturing method or the like for a nozzle substrate which can form a desired nozzle shape. SOLUTION: The manufacturing method includes the process of opening a nozzle supply port 31B-1 from one surface side of a silicon substrate 51 and forming a recess to be a nozzle 31, the process of applying a liquid substance and forming a coating film 54 which covers a surface which has the recess to be the nozzle 31, and the process of forming a nozzle ejection port 31A-1 by performing anisotropic wet etching and penetrating the recess from a surface of the opposite side to the surface which has the recess to be the nozzle 31. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008279707(A) 申请公布日期 2008.11.20
申请号 JP20070127649 申请日期 2007.05.14
申请人 SEIKO EPSON CORP 发明人 KUROKOCHI YOICHI;OTANI KAZUFUMI
分类号 B41J2/135;B41J2/045;B41J2/055 主分类号 B41J2/135
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