发明名称 |
MANUFACTURING METHOD FOR NOZZLE SUBSTRATE, LIQUID DROPLET EJECTION HEAD AND LIQUID DROPLET EJECTOR |
摘要 |
PROBLEM TO BE SOLVED: To obtain a manufacturing method or the like for a nozzle substrate which can form a desired nozzle shape. SOLUTION: The manufacturing method includes the process of opening a nozzle supply port 31B-1 from one surface side of a silicon substrate 51 and forming a recess to be a nozzle 31, the process of applying a liquid substance and forming a coating film 54 which covers a surface which has the recess to be the nozzle 31, and the process of forming a nozzle ejection port 31A-1 by performing anisotropic wet etching and penetrating the recess from a surface of the opposite side to the surface which has the recess to be the nozzle 31. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2008279707(A) |
申请公布日期 |
2008.11.20 |
申请号 |
JP20070127649 |
申请日期 |
2007.05.14 |
申请人 |
SEIKO EPSON CORP |
发明人 |
KUROKOCHI YOICHI;OTANI KAZUFUMI |
分类号 |
B41J2/135;B41J2/045;B41J2/055 |
主分类号 |
B41J2/135 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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