发明名称 PLASMA TREATMENT APPARATUS AND METHOD OF PLASMA TREATMENT
摘要 A plasma treatment apparatus and a method of plasma treatment for reducing generation of Na atoms in the case where a silica glass and the like are used for a member made of dielectric material are provided. The provided plasma treatment apparatus includes a dielectric member having an impurity element forming positive and movable ions, a vacuum chamber partially sealed with the dielectric member, and a radiator radiating electromagnetic wave into the vacuum chamber through the dielectric member to generate plasma in the vacuum chamber and to treat a workpiece using the plasma. The apparatus further includes an electrode on the dielectric member on a surface opposite the surface exposed to the plasma. The generation of Na can be reduced by applying to the plasma a negative DC potential which is lower than a floating potential measured at the surface of the dielectric member exposed to the plasma.
申请公布号 US2008283507(A1) 申请公布日期 2008.11.20
申请号 US20080117612 申请日期 2008.05.08
申请人 CANON KABUSHIKI KAISHA 发明人 KITAGAWA HIDEO;FUKUCHI YUSUKE
分类号 B23K9/00 主分类号 B23K9/00
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