| 摘要 |
<p>Provided is an exposure method wherein influence of fluctuation of a gas between a projection optical system and a photosensitive board, such as a wafer, is suppressed and planarity of the photosensitive board is maintained high during exposure as needed. In the exposure method for exposing a wafer (W) to exposure light through a projection optical system (PL), a glass substrate (29) which integrally moves with the wafer (W) and transmits exposure light is arranged between the projection optical system (PL) and the wafer (W), a liquid (LQ) which transmits exposure light is supplied between the projection optical system (PL) and the glass substrate (29), and the wafer (W) is exposed to exposure light through the projection optical system (PL), the liquid (LQ) and the glass substrate (29).</p> |
