| 摘要 |
A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus is configured to provide the radiation beam with a radiation distribution in a pupil plane of an illumination system of the apparatus, the intensity of the radiation contained substantially within a plurality of discrete areas across the radiation beam and the radiation beam having one or more first regions of a first polarization having a spatial distribution across the pupil plane which overlap partial portions of the discrete areas and one or more second regions of a second polarization having a spatial distribution in areas across the pupil plane which overlap the rest of the discrete areas other than the partial portions. The apparatus further includes a polarization filter, in the radiation beam path between at least part of the projection system and the substrate, configured to selectively transmit parts of the radiation beam having a polarization of only one of said first and second polarizations, such that only radiation corresponding to either said partial portions or said rest of the discrete areas is incident on the target portion of the substrate.
|
