发明名称 CVD APPARATUS, SEMICONDUCTOR DEVICE, AND PHOTOELECTRIC CONVERTER
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a CVD apparatus having improved productivity by suppressing deterioration in a catalyst body, and to provide a semiconductor device and a photoelectric converter manufactured by the CVD apparatus. <P>SOLUTION: A shower plate 24 divides a space S in a chamber body 21 into two to form a first chamber S1 forming a film and a second chamber S2 excluding the first chamber S1. A connection terminal holder 31 arranges respective connection terminals 32 in the second chamber S2 each, and guides both the ends of the catalyst body W up to the second chamber S2 each. A first regulation valve Vc1 regulates pressure in the first chamber S1 to first target pressure, and a second regulation valve Vc2 regulates the pressure in the second chamber S2, to a second target pressure lower than the first value. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008283146(A) 申请公布日期 2008.11.20
申请号 JP20070128517 申请日期 2007.05.14
申请人 ULVAC JAPAN LTD 发明人 SAKATA GENJI;TAKAGI MAKIKO;FUJINAGA TETSUSHI;AIHARA TSUTOMU;WATANABE AKIRA
分类号 H01L21/205;C23C16/24;C23C16/42;C23C16/44;H01L21/31;H01L31/04 主分类号 H01L21/205
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