| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface inspection apparatus that can perform an inexpensive and high-throughput inspection. SOLUTION: The surface inspection apparatus 1 includes: an illumination optical system 30 that irradiates linear polarized light L1 to the surface of a wafer 10 on which a repeat-pattern is formed; an alignment stage 20 that holds the wafer 10; an imaging optical system 40 that takes an image of the reflective light from the surface of the wafer 10; an image memory unit 51 for memorizing images taken by the imaging optical system 40; an image processing unit 52 that detects a defect of the repeat pattern by performing a predetermined image processing to the image memorized in the image memory unit 51; and a processed result output unit 53 that outputs the result of the image processing by the image processing unit 52, wherein the direction of the transmission axis of the second polarizing plate 43 is set to incline to the transmission axis of the first polarizing plate 32 at an inclining angle of≥45°and <90°, or >90°and≤135°. COPYRIGHT: (C)2009,JPO&INPIT
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