发明名称 Method of growing gan crystal on silicon substrate, and light emitting device and method of manufacturing thereof
摘要 Example embodiments are directed to a method of growing GaN single crystals on a silicon substrate, a method of manufacturing a GaN-based light emitting device using the silicon substrate, and a GaN-based light emitting device. The method of growing the GaN single crystals may include forming a buffer layer including a TiN group material or other like material on a silicon substrate, forming a nano-pattern including silicon oxide on the buffer layer, and growing GaN single crystals on the buffer layer and the nano-pattern.
申请公布号 US2008283821(A1) 申请公布日期 2008.11.20
申请号 US20080073097 申请日期 2008.02.29
申请人 SAMSUNG CORNING CO., LTD. 发明人 PARK SUNG-SOO;LEE JUNE-KEY
分类号 H01L21/205;H01L33/00;H01L33/12;H01L33/20 主分类号 H01L21/205
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