PHOTORESIST DEVELOPING SOLUTION

摘要

[PROBLEMS] To provide a developing solution which can be used suitably for the development of a thick resist comprising a chemically amplified resist. [MEANS FOR SOLVING PROBLEMS] Disclosed is a photoresist developing solution comprising an aqueous quaternary ammonium compound solution containing an anionic surfactant and a cationic surfactant, wherein the anionic surfactant is represented by the formula (1) and is contained in an amount of 0.1 to 5% by mass and the cationic surfactant is contained in an amount of 0.01 to 2% by mass relative to 100% by mass of the total mass of the photoresist developing solution. (1) wherein R<SUP>1</SUP> represents a hydrogen atom or a methyl group; R<SUP>2</SUP> represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; A represents an alkylene group having 1 to 4 carbon atoms, provided that AO's may be the same as each other or may be a combination of different two or more groups in the molecule; p is an integer of 1 to 3; m is an integer of 5 to 30; and M represents a hydrogen atom or an ammonium ion.