发明名称 |
TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION |
摘要 |
<p>(1) A polymer compound for photoresist compositions which is high in storage stability and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided; and (3) a photoresist composition with improved LWR containing the subject polymer compound are further provided. In detail, [1] a tertiary alcohol derivative represented by the following general formula (1) is provided.
(In the formula, wherein R 1 represents a linear alkyl group having from 1 to 6 carbon atoms, a branched alkyl group having from 3 to 6 carbon atoms or a cyclic alkyl group having from 3 to 6 carbon atoms; R 2 represents a hydrogen atom or a methyl group; W represents a linear alkylene group having from 1 to 10 carbon atoms, a branched alkylene group having from 3 to 10 carbon atoms or a cyclic alkylene group having from 3 to 10 carbon atoms; n represents 0 or 1; and p represents 1 or 2.)</p> |
申请公布号 |
EP1992650(A1) |
申请公布日期 |
2008.11.19 |
申请号 |
EP20070714421 |
申请日期 |
2007.02.16 |
申请人 |
KURARAY CO., LTD. |
发明人 |
NAKAYAMA, OSAMU;ARATANI, ICHIHIRO |
分类号 |
C08F20/28;C07D307/32;C07D309/10;G03F7/039;H01L21/027 |
主分类号 |
C08F20/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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