| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type radiation sensitive resist composition giving an improved resist pattern shape independently of the wavelength of ionizing radiation for irradiation. SOLUTION: The radiation sensitive positive type resist composition contains a resin having a rate of dissolution in an alkali developing solution increased by the action of an acid, a compound which generates the acid when irradiated with ionizing radiation, a solvent and a compound having a bond which is cleaved by the acid to generate ionic compounds, at least one of which contains a compound nonreactive with a proton donative compound in the composition. |
