发明名称 Calibration substrate and method for calibrating a lithographic apparatus
摘要 A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate has a thermal expansion coefficient of less than about 1.0x10<SUP>-6 </SUP>K<SUP>-1 </SUP>to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.
申请公布号 US7453063(B2) 申请公布日期 2008.11.18
申请号 US20040006819 申请日期 2004.12.08
申请人 ASML NETHERLANDS B.V. 发明人 OTTENS JOOST JEROEN;MERTENS JEROEN JOHANNES SOPHIA MARIA;DE JONG FREDERICK EDUARD;GOORMAN KOEN;MENCHTCHIKOV BORIS
分类号 H01J37/256;G03B27/58;H01L21/00 主分类号 H01J37/256
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