发明名称 |
Calibration substrate and method for calibrating a lithographic apparatus |
摘要 |
A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate has a thermal expansion coefficient of less than about 1.0x10<SUP>-6 </SUP>K<SUP>-1 </SUP>to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.
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申请公布号 |
US7453063(B2) |
申请公布日期 |
2008.11.18 |
申请号 |
US20040006819 |
申请日期 |
2004.12.08 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
OTTENS JOOST JEROEN;MERTENS JEROEN JOHANNES SOPHIA MARIA;DE JONG FREDERICK EDUARD;GOORMAN KOEN;MENCHTCHIKOV BORIS |
分类号 |
H01J37/256;G03B27/58;H01L21/00 |
主分类号 |
H01J37/256 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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