发明名称 Method of manufacturing a display device
摘要 In order to suppress defect modes such as shrinkage or unevenness in light-emission in a light emitting element and to shorten a time needed for a pretreatment for forming a layer containing an organic compound (EL layer), according to the present invention, a light emitting element is formed by forming a first electrode that is electrically connected to a source region or a drain region of a thin film transistor, forming an insulating film to cover an edge portion of the first electrode, performing a plasma treatment on the first electrode and the insulating film in an atmosphere containing argon and oxygen, then, forming a layer containing an organic compound (EL layer) over the first electrode and the insulating film, and forming a second electrode over the layer containing an organic compound (EL layer).
申请公布号 US7452257(B2) 申请公布日期 2008.11.18
申请号 US20030736790 申请日期 2003.12.17
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TSUCHIYA KAORU;ISHIGAKI AYUMI;SAITO KEIKO
分类号 H01J9/00;H01L27/32;H01L51/56;H05B33/10;H05B33/26 主分类号 H01J9/00
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