METHOD OF MANUFACTURING SEMICONDUCTOR DIODE AND METHOD OF MANUFACTURING PRAM USING THE SAME

摘要

The method of manufacturing the semiconductor diode is provide to reduce the generation of defects including the processing defection, the thermal stress etc. A step is for forming the first amorphous thin film(12a) having the first impurity on the single crystal substrate(10). A step is for forming the second amorphous thin film(12b) having the second impurity on the first amorphous thin film. A step is for forming the first amorphous thin film and the second amorphous thin film as the first single crystal thin film and the second single crystal thin film when the laser beam(14) is investigated and the phase change of the second amorphous thin film and the first amorphous thin film occurs.