发明名称 Method for manufacturing flip-chip type semiconductor device featuring nickel electrode pads, and plating apparatus used in such method
摘要 In a method for manufacturing a semiconductor device, either a nickel layer or a nickel-based metal layer is formed on a semiconductor substrate by using a plating process. Then, either the nickel layer or the nickel-based metal layer is washed with one of an aqueous hydrochloric acid solution and an aqueous sulfuric acid solution.
申请公布号 US7452749(B2) 申请公布日期 2008.11.18
申请号 US20060364274 申请日期 2006.03.01
申请人 NEC ELECTRONICS CORPORATION 发明人 TACHIBANA HIROAKI
分类号 H01L21/44;H01L21/00 主分类号 H01L21/44
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