| 摘要 |
<p>The imprint temperature can be drastically lowered by using the imprint resist as the thermoplastic polymer which has a very low glass transition temperature. A step is for coating the PBMA resist layer on the substrate(11) by spin-coating the PBMA resist liquid having the PBMA. A step is for forming the PBMA pattern on the substrate by imprinting the pattern on the PBMA resist layer using the stamp having the predetermined pattern. In the nano imprint process, the imprint resist is the thermoplastic polymer whose the glass transition temperature is 5~60 deg C. The nano imprint process can reduce the existing imprint temperature of 200 deg C to 100 deg C or less.</p> |
