| 摘要 |
A semiconductor device according to an embodiment includes an insulated-gate field-effect transistor including a gate insulation film provided on a major surface of a semiconductor substrate, a gate electrode provided on the gate insulation film, and a source and a drain provided spaced apart in the semiconductor substrate such that the gate electrode is interposed between the source and the drain, a first contact wiring line which is provided on the source, a second contact wiring line which is provided on the drain, and a piezoelectric layer which is provided to cover the gate electrode and has one end and the other end connected between the first and second contact wiring lines.
|
