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发明名称
矽单晶之制造方法
摘要
[课题]提供:可将结晶轴方位为[110]之无差排(dislocation)的矽单晶,稳定地育成之矽单晶的制造方法。[解决手段]藉由上拉法(Czochralski method)的矽单晶之育成方法,系使用硼浓度为1.7×10#sP!19#eP! atoms/cm#sP!3#eP!以上之种晶,将由晶颈部终端到肩部而形成之圆锥部的开口角(θ),作为120~50°而形成肩部,来育成结晶轴方位为[110]的矽单晶。若将在育成时的晶颈部的直径设为5~10 mm,则可变得比通常采用的晶颈部直径还粗。
申请公布号
TW200844271
申请公布日期
2008.11.16
申请号
TW097109663
申请日期
2008.03.19
申请人
上睦可股份有限公司
发明人
稻见修一
分类号
C30B15/00(2006.01);C30B29/06(2006.01)
主分类号
C30B15/00(2006.01)
代理机构
代理人
林志刚
主权项
地址
日本
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