发明名称 SEMICONDUCTOR LAYER FOR THIN FILM TRANSISTOR
摘要 A method for making a zinc oxide semiconductor layer for a thin film transistor using solution processing at low temperatures is disclosed. The method comprises making a solution comprising a zinc salt and a complexing agent; applying th e solution to a substrate; and heating the solution to form a semiconductor layer on th e substrate. A thin film transistor using this zinc oxide semiconductor layer has good mobility and on/off ratio.
申请公布号 CA2631046(A1) 申请公布日期 2008.11.16
申请号 CA20082631046 申请日期 2008.05.09
申请人 XEROX CORPORATION 发明人 ONG, BENG S.;LI, YUNING
分类号 B41J2/01;H01L21/34;B41J15/00;C23C18/08;H01L21/368;H01L21/46;H01L49/02 主分类号 B41J2/01
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