发明名称 |
SEMICONDUCTOR LAYER FOR THIN FILM TRANSISTOR |
摘要 |
A method for making a zinc oxide semiconductor layer for a thin film transistor using solution processing at low temperatures is disclosed. The method comprises making a solution comprising a zinc salt and a complexing agent; applying th e solution to a substrate; and heating the solution to form a semiconductor layer on th e substrate. A thin film transistor using this zinc oxide semiconductor layer has good mobility and on/off ratio.
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申请公布号 |
CA2631046(A1) |
申请公布日期 |
2008.11.16 |
申请号 |
CA20082631046 |
申请日期 |
2008.05.09 |
申请人 |
XEROX CORPORATION |
发明人 |
ONG, BENG S.;LI, YUNING |
分类号 |
B41J2/01;H01L21/34;B41J15/00;C23C18/08;H01L21/368;H01L21/46;H01L49/02 |
主分类号 |
B41J2/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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