| 摘要 |
<p>Interference patterning of substrates. An interference pattern including an interference fringe may be generated to illuminate a substrate, the area on the substrate actually illuminated by the interference pattern can be limited, the illuminated area can be displaced across the substrate in a direction crossing the interference fringe, and a substantially constant position of the interference pattern relative to the substrate can be maintained despite the displacement of the illuminated area.</p> |
