| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition and a method for removing one or more kinds among a resist, etching residual, flattening residual, and metal oxide from a substrate containing aluminum or aluminum-copper-alloy. SOLUTION: The composition is to remove one or more kinds among a resist, etching residual, flattening residual, and metal oxide from the substrate containing aluminum or aluminum-copper-alloy; and contains a component giving a fluoride of approximate 0.005 wt.% to 5 wt.%, a glycol solvent of approximate 1 wt.% to 50 wt.%, acid containing phosphorus, and water. The composition is contacted with the substrate. COPYRIGHT: (C)2009,JPO&INPIT |
