POLYMERIZABLE MONOMER AND POLYMER COMPOUND, HAVING FLUORINE ATOM-CONTAINING HEMIACETAL ESTER STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a polymerizable monomer for photoresist. SOLUTION: A polymerizable monomer represented by formula (1) [wherein, Rais H or methyl; and Rbis an aliphatic or alicyclic hydrocarbon group substituted with a fluorine atom, or a group comprising a plurality of aliphatic or alicyclic hydrocarbon groups (at least one is an aliphatic or alicyclic hydrocarbon group substituted with a fluorine atom) bonded through a coupler containing a hetero atom] is provided. COPYRIGHT: (C)2009,JPO&INPIT