发明名称 SEMI-INSULATING GaAs WAFER AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semi-insulating GaAs wafer capable of reducing the rate of occurrence of defectives after treatment and to provide a method for producing the same. SOLUTION: In a semi-insulating GaAs wafer having a diameterΦnot smaller than 4 inches, provided that R is the wafer radius and a circle part having a radius of (2/3)*R from the wafer center is the center part, the average dislocation density of the outer peripheral part that is the part other than the center part in the plane of the wafer is larger than the average dislocation density of the center part. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008273804(A) 申请公布日期 2008.11.13
申请号 JP20070122485 申请日期 2007.05.07
申请人 HITACHI CABLE LTD 发明人 TAIHO KOJI;YABUKI SHINJI;NEMOTO SHIYUUSEI
分类号 C30B29/42;C30B15/20;C30B27/02 主分类号 C30B29/42
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