| 摘要 |
A method of real-time monitoring implantation includes plotting a calibration curve for monitoring implantation first. Next, a testing substrate covered a photoresist is provided and then implanted. Since photoresist surface roughness will be changed after implantation, surface roughness change could be quantitatively determined by monitoring scattering light. Finally, the detected scattering light intensity is used to calculate the corresponding implantation condition by the use of the calibration curve.
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