| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve such problems that direct exposure equipment having multiple heads generally conducts overlapping exposure at an exposure area boundary between heads, however, if the heads are misaligned, a flaw will occur in a pattern shape at an area that is subject to overlapping exposure. <P>SOLUTION: TEGs (test element groups) are disposed for evaluating line width and resistance at an overlapping exposure area between the exposure heads and at a returning exposure area formed when direct exposure equipment having a multi-head configuration exposes a substrate. By catching changes in measured values, misalignment in the multiple exposure heads can be detected. <P>COPYRIGHT: (C)2009,JPO&INPIT |
