| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve throughput in liquid immersion lithography. <P>SOLUTION: A liquid immersion exposure apparatus is disclosed. At least a part of a liquid supply system to supply a liquid between a projection system and a substrate is moveable in a plane substantially parallel to a top face of the substrate during scanning. The part is moved to reduce the relative speed between that part and the substrate, so that the speed of the substrate relative to the projection system may be increased. <P>COPYRIGHT: (C)2009,JPO&INPIT |
